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ASML targets 2033 for High-NA EUV with larger masks, promising a 40% productivity gain

High-NA EUV is ASML's next major lithography platform. It can print finer features than today's EUV tools, which could help chipmakers build denser designs at advanced nodes....

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ASML to work with major chipmakers to use latest tools for larger chips

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Big chipmakers are already committed to using ASML's next-generation production technology by as soon as 2028

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