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[News] TSMC Strengthens Its Advanced Process with Next-Generation EUV Equipment Reportedly Arriving This Month | TrendForce Insights

According to a report by the Economic Daily News, TSMC's first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will ar...

According to a report by the Economic Daily News, TSMC’s first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month, aiding the company in progressing its advanced process technology. The report has cited industry rumors, pointing out that TSMC’s first High-NA EUV machine is expected to be moved to its Global R&D Center for research purposes, addressing the development needs of future advanced processes like A14. Due to the inability to disassemble the optical lens components, the equipment is taller than a conference room and significantly longer than the previous generation.

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