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ASML Delivers First 2nm-Generation Low-NA EUV Tool, the Twinscan NXE:3800E
by Anton Shilov on March 13, 2024 7:30 AM EST - Posted in - Semiconductors - EUV - ASML - Twinscan Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made using Low-NA EUV litho tools.
Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. The latest iteration of the company's line of 0.33 numerical aperture (Low-NA) lithography scanners, the NXE:3800E is aimed at making chips on 2nm and 3nm-class technologies. For ASML's logic and memory fab customers – a list these days that is only around half a dozen companies in total – the updated scanner will help these foundries continue to improve and expand their production of leading-edge chips.
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