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Canon delivers first nanoimprint lithography tool to US institute backed by Intel, Samsung, DARPA
Aims to sell 20 such tools over the next few years.
Canon made quite a splash last year when it introduced its first nanoimprint lithography (NIL) machine, which can produce chips without using traditional DUV or EUV systems. This week the Japanese company delivered its FPA -1200NZ2C nanoimprint lithography system to the Texas Institute for Electronics (TIE) for study, according to Nikkei. It is also supported by DARPA, which recently awarded TIE and UT with a$1.4 billion grant to build multi-chiplet 3D processors for military and civilian applications.
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