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China defies ASML prediction with EUV breakthrough in advanced chip production
Research team achieves world-class results in photolithography research with solid-state laser-driven approach, paper shows.
The team, from the Chinese Academy of Sciences’ Shanghai Institute of Optics and Fine Mechanics, was led by Lin Nan, previously head of light source technology at ASML in the Netherlands. Lin returned to China in 2021 as part of the country’s overseas high-level recruitment drive and founded the advanced photolithography technology research group that was responsible for the paper. Before joining ASML, Lin was mentored by Anne L’Huillier, winner of the 2023 Nobel Prize for physics and a member of the Royal Swedish Academy of Sciences, as part of a scholarship awarded by the European Union’s Marie Sklodowska-Curie Actions programme.
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