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China-based firm delivers its first chipmaking tool that stamps nanoscale processor designs onto wafers — Prinano's nanoimprint lithography tool uses quartz molds engraved with circuits
China's Prinano Technology has shipped its first domestically developed semiconductor-grade step-and-repeat nanoimprint lithography system that offers sub-10 nm single-step patterning for applications like memory, photonics, and advanced packaging.
It applies the resist using a high-precision inkjet system that dynamically adjusts droplet volume for different pattern densities to ensure a thin, uniform residual layer (under 10nm, with less than 2nm variation). NIL's single-step reproduction of sub-10 nm lines is potentially simpler than EUV’s multipatterning for the same size, but only if the quartz mold can be manufactured with matching accuracy and defects can be kept low. With chips featuring loads of regular structures it is possible to implement redundancy without substantial increase of costs, but this is much harder to do with intricate logic, so any imperfection can be a yield killer.
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