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Chinese scientists create 'breakthrough' solid-state DUV laser light source for chipmaking tools
But it is orders of magnitude less powerful than those of ASML.
Researchers from the Chinese Academy of Sciences (CAS) have created a "breakthrough" solid-state deep ultraviolet(DUV) laser emitting coherent 193-nm light used for semiconductor photolithography in a lab, reports the International Society for Optics and Photonics ( SPIE). When high-voltage electrical pulses are applied, the argon and fluorine atoms become excited and briefly form an unstable molecule called ArF (or excimer), which quickly returns to its ground state, releasing a photon with a wavelength of 193 nm. While the initial CAS system demonstrates capabilities, its low power output makes it unsuitable for commercial semiconductor manufacturing, where high throughput and process stability are essential.
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