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Imec demonstrates electrical yield for 20nm lines High NA EUV single patterning
Nanoimprint Lithography Aims to Take on EUV
ASML CEO says China is 10 to 15 years behind in chipmaking capabilities | But Chinese companies are working on EUV tools.
Japanese researchers testing particle accelerator for chipmaking — researchers claim EUV-like lithography capabilities
ASML Aims for Hyper-NA EUV, Shrinking Chip Limits
TSMC’s EUV machines are equipped with a remote self-destruct in case of an invasion
