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Japanese researchers testing particle accelerator for chipmaking — researchers claim EUV-like lithography capabilities
Because...why not?
"The FEL beam's extreme power, its narrow spectral width, and other features make it suitable as an application for future lithography," Norio Nakamura, researcher in advanced light sources at KEK, told Spectrum.IEEE.org in an interview. Finally, assuming that there is a complex set of mirrors that can guide 10 kW of EUV radiation to 10 litho tools, there are no resists and pellicles that are compatible with such a powerful light source. Nakamura acknowledged that numerous technical challenges must be resolved before an ERL-based litho tool can achieve the high levels of performance and operational stability required for commercial chipmaking.
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