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Multibeam launches chip industry’s 1st multicolumn E-Beam lithography
Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better.
Multibeam’s platform revolutionizes e-beam lithography (EBL) with new productivity advantages, while enabling high resolution, fine features, wide field of view, and large depth of focus. The chief productivity driver is the novel architecture which employs multiple miniature columns that operate individually and in parallel, with an advanced control system directing the beams to achieve maximum accuracy, quality, and speed. To further enable design flexibility, the platform leverages technology from EDA leader, Synopsys, to generate write recipes, which lets customers achieve their most intricate patterns.
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