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NVIDIA's 'cuLitho' Computational Lithography Adopted By TSMC and Synopsys For Production Use
by Anton Shilov on March 18, 2024 6:00 PM EST - Posted in - Semiconductors - NVIDIA - TSMC - Synopsys - CuLitho Last year, NVIDIA introduced its CuLitho software library, which promises to speed up photomask development by up to 40 times. Today, NVIDIA announced a partnership with TSMC and Synopsys to implement its computational lithography platform and use the company's next-generation Blackwell GPUs for AI and HPC applications.
Today, NVIDIA announced a partnership with TSMC and Synopsys to implement its computational lithography platform and use the company's next-generation Blackwell GPUs for AI and HPC applications. The development of photomasks is a crucial step for every chip ever made, and NVIDIA's CuLitho platform, enhanced with new generative AI algorithms, significantly speeds up this process. This enhancement is particularly beneficial for the optical proximity correction (OPC) process, allowing the creation of near-perfect inverse masks to account for light diffraction.
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