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Speeding up computational lithography with the power and parallelism of GPUs
A new lithography library brings mask optimization operations to GPUs.
The traditional way to handle this is with optical proximity correction (OPC), which adjusts edges and polygons to optimize the etched features and match the design intent as closely as possible. Additional recipes, flows, and functions continue to be enabled for GPUs, AI machine learning (ML) is being increasingly applied, and more effective CPU+GPU co-optimization is advancing. All the latest results will be presented in a on “Leveraging NIM and GPU Acceleration to Transform Chip Design with AI” at the NVIDIA GTC conference on Friday, March 21, in San Jose, California.
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